Work

3D model assessment of a directional etch patterning process

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3055672

Authors: Matthew Gallagher, Shubhankar Das, Victor M. Blanco Carballo, Mircea V. Dusa

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409677381

FWCI:

Cites: 4

Cited by:

Related to: 10