Work

Wet clean oxidation for optimal line width and LER

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051476

Authors: Steven McDermott, Keith P. Donegan, Colleen Meagher, We-Shang Lo, Jennifer Church, Chanro Park, Allen Gabor

Institution: IBM (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409677650

FWCI:

Cites: 4

Cited by:

Related to: 10