Work

The impact of electron temperature on etch profiles in Ar/CF4 plasmas

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3052705

Authors: Nayeon Kim, Junyoung Park, Jung-Eun Choi, Min-Seok Kim, Myoung-Jae Lee, Chin-Wook Chung

Institution: Hanyang University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409677853

FWCI: 2.358

Cites: 1

Cited by: 1

Related to: 10