PFAS substitution in photolithography materials: strategies and progress
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3050877
Authors: Qiuzhe Xie, Cong Liu, Paul LaBeaume, Mingqi Li, Joseph Lachowski, Ed Orr, Drew Chambers, Kenneth Hernandez, Mitsuru Haga, Edon Vitaku
Institution: DuPont (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409678428