Metal oxide resist formulation and process advancements towards high-NA EUV lithography
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3051549
Authors: Amrit K. Narasimhan, Alexander C. Marwitz, Kanta Yanagi, Peter De Schepper, Dylan Vu, Jan Doise, Kai Jiang, Kevin Woo, Brian Cardineau, Kazuki Kasahara, Jason K. Stowers
Institution: Inpria (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409678441