Work

New photoacid generators designed for advanced EUV patterning

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051091

Authors: Kamal P. Pandey, Emad Aqad, Jong Keun Park, Li Cui, Yinjie Cen, Timothy J. Eugster, Conner Hoelzel, Vageesha Liyanam Gunawardana, K.A. Niradha Sachinthani, Suzanne M. Coley, Benjamin D. Naab, Rochelle Rena, Sylvie Eckert, Jayoung Koo, HyunHo Yoon, Philjae Kang, Edon Vitaku, Karen Petrillo

Institutions: DuPont (United States), IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409678459

FWCI: 4.585

Cites: 6

Cited by: 2

Related to: 10