Treatment of PFAS substances in lithography
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3050904
Authors: Shinji Kobayashi, Ryo Suemasa, Kunie Ogata
Institutions: Tokyo Electron Kyushu Ltd (Japan), Tokyo Electron (Japan)
Language: English
Subfield: Environmental Chemistry
Field: Environmental Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409678580
