Work

Exploring stochastic reduction and lithographic performance by using EUV CAR-NTD

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050920

Authors: Keiyu Ou, Naohiro Tango, Nishiki Fujimaki, Toru Fujimori

Institution: Fujifilm (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409678619

FWCI:

Cites: 3

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Related to: 10