Work

Lithographic properties of a novel metalloid-based resist

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050217

Authors: Ruihao Zhou, Mark Neisser, Huaping Xu

Institution: Tsinghua University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409678678

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