Work

Understanding the role of underlayers in enhancing EUV resist sensitivity

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051496

Authors: Honggu Im, Terry R. McAfee, Qi Zhang, Patrick Naulleau, Bruno La Fontaine, Oleg Kostko

Institution: Lawrence Berkeley National Laboratory

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409679197

FWCI:

Cites: 18

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Related to: 10