Work

Low-NA EUV extension technology of contact patterning using MOR process

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051232

Authors: Jeonghee Choi, Muhak Gi, Kwangmin Choi, Seyyoung Jeon, Yeonshin Kim, Sejeong Um, Sudeok Kim, Moosong Lee, Seongbo Shim, Woo Jin Jung, TaeHoi Park, Byeongju Kim, Sangho Yun, Chan Hwang, Sang Wuk Park

Institution: Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409679198

FWCI:

Cites: 2

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Related to: 10