Work

Enabling high resolution pillar patterning using EUV metal oxide resist by functional underlayer design

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050842

Authors: Sudha Rathi, Harry Whitesell, Karthik Janakiraman

Institution: Applied Materials (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409679200

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