Work

Effect of composition uniformity in the polymer chain of EUV photoresist on lithographic performance

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051237

Authors: Euijin Ko, Yoorim Jang, KwangMo Choi, Philjae Kang, Nara Shin, Yoojung Yoon, Joongyeop Lee, Jayoung Koo, Yunji Kim, Karen Petrillo, Jae Hwan Sim

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409679203

FWCI: 6.901

Cites: 4

Cited by: 3

Related to: 10