Work

Polymer sequence alters sensitivity and resolution in chemically-amplified polypeptoid photoresists

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051105

Authors: Cameron P. Adams, Carolyn Henein, Chenyun Yuan, Christopher K. Ober, Rachel A. Segalman

Institution: University of California, Santa Barbara

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409679213

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