Work

Consideration on segregation behavior of the surface localization material and the pattern roughness degradation in EUV lithography

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050962

Authors: KwangMo Choi, YunJi Kim, Philjae Kang, Jung Suk Kim, Yinjie Cen, Jong Keun Park, James R. Marsh, Karen Petrillo, Jae Hwan Sim

Institutions: DuPont (United States), IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409679216

FWCI:

Cites: 3

Cited by:

Related to: 10