Work

Development of a negative-tone EUV photoresist system

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3054476

Authors: Rikio Kozaki, Toshiya Okamura, Youngjin Kim, Youngjun Her, Hengpeng Wu, Kun Si, Chenyang Ma, Ralph R. Dammel, Yi Cao

Institution: Merck KGaA, Darmstadt (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409679229

FWCI:

Cites: 5

Cited by:

Related to: 10