Work

New insights into high electron affinity photoacid generators and their impact on EUV chemically amplified resist performance

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051514

Authors: Emad Aqad, Jong Keun Park, Li Cui, Yinjie Cen, Cara Gannett, Vageesha Liyana Gunawardana, Kamal P. Pandey, Conner Hoelzel, Niradha K. Sachinthani, Zhou Li, Benjamin D. Naab, Suzanne M. Coley, MingQi Li

Institution: DuPont (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409679233

FWCI: 2.293

Cites: 12

Cited by: 1

Related to: 10