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New molecular resist design for advanced patterning

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051143

Authors: Vageesha Liyana Gunawardana, Emad Aqad, Li Cui, Rochelle Rena, Sylvie Eckert, Jong Keun Park, Jason Behnke, Karen Petrillo

Institutions: DuPont (United States), IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409679237

FWCI:

Cites: 2

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Related to: 10