Work

Logic patterning and roughness improvement applications with directional ion beam etch

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051506

Authors: Shruti Jambaldinni, Ali Haider, Benjamin Kam, Xiaoyu Kang, Mohand Brouri, Shuogang Huang, Anuja De Silva, Rich S. Wise, Shubhankar Das, Nicola N. Kissoon, Victor M. Blanco Carballo, Etienne P. de Poortere, Arup Saha

Institutions: Lam Research (United States), IMEC, ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409679238

FWCI: 6.901

Cites: 2

Cited by: 3

Related to: 10