Work

Patterning performance of perfluoroalkyl substances (PFAS) free EUV chemically amplified resists: a step towards environmentally friendly lithographic chemicals

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3052050

Authors: Danilo De Simone, Emily E. Gallagher

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Responsible consumption and production

Open Access status: closed

OpenAlex ID: W4409679254

FWCI: 2.358

Cites: 2

Cited by: 1

Related to: 10