Work

Tight-pitch contact-hole patterns in EUV lithography

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050086

Authors: Cong Que Dinh, Nathan Antonovich, Kanzo Kato, Alexandra Krawicz, Shu Kitamura, Lior Huli, Kayoko Cho, Hikari Tomori, Makoto Muramatsu, Naoki Shibata, Takashi Saito

Institutions: Tokyo Electron Kyushu Ltd (Japan), Tokyo Electron (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409679256

FWCI: 2.293

Cites: 16

Cited by: 1

Related to: 10