Work

Overcoming challenges raised by wafer load grid overlay fingerprints and correction per exposure management

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050691

Authors: Benjamin Duclaux, Allwyn Boustheen, Anne Pastol, Othman EL Hassani, Maxime Gatefait, Blandine Minghetti, Bin Chen, Auguste Lam, Laurent Lecarpentier

Institutions: STMicroelectronics (France), ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409716676

FWCI: 2.358

Cites: 3

Cited by: 1

Related to: 10