Work

An Accurate and Transferable ReaxFF Parameter Set toward the Simulation of a Plasma Etching Process in Semiconductor Manufacturing

Year: 2025

Type: article

Source: The Journal of Physical Chemistry C

DOI: 10.1021/acs.jpcc.4c08709

Authors: Jinhuan Zhong, Qinhao Sun, Zhipeng Gao, Junting Li, Pengfei Shi, Huajie Xu, Yang Wang

Institution: Southwest Jiaotong University

Language: English

Topic: Advanced Chemical Physics Studies

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Southwest Jiaotong University, Department of Science and Technology of Sichuan Province, National Key Research and Development Program of China, Fundamental Research Funds for the Central Universities

Awards: G2743692000, G3254221261, G3376886934, G4119427149, G5322394265, G595152038, G7009187231, G7694120268, G7807492518, G8401869153, G8466783062, G8710490553

OpenAlex ID: W4409721450

FWCI: 2.311

Cites: 36

Cited by: 6

Related to: 10