Ab Initio Study on 3D Anisotropic Ferroelectric Switching Mechanism and Coercive Field in HfO 2 and ZrO 2
Year: 2025
Type: article
Abstract: This study proposes a new ferroelectric switching mechanism in HfO 2 ‐based ferroelectric films by using density functional theory calculations. It predicts a theoretical coercive field (E c ) consistent with the experimental value (≈1 MV cm −1 ). To this end, this work considers the anisotropic nucleation and growth of reversed polarization along the three principal axes of the orthorhombic phase of HfO 2 and ZrO 2 . This approach differs from the earlier theoretical study that assumed homogeneous switching and predicted too high E c (≈10 MV cm −1 ), and from the recent theoretical prediction that assumed domain switching but still predicted unrealistically high E c . Along the b‐direction involving the non‐polar spacer sub‐unit cell layer, the switching barriers (E s s) for nucleation and growth of a reversed domain are similar. In contrast, along the a‐direction, which lacks a non‐polar layer and is previously overlooked, nucleation affects neighboring polar layers, significantly reducing the E s for growth. Switching types along the c‐direction (homogeneous or stepwise) has little effect on the overall E s . These distinct E s characteristics along three directions predict an E c of 1–2 MV cm −1 for a 10‐nm‐thick (Hf,Zr)O 2 film, consistent with experimental results.
Source: Advanced Functional Materials
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $5,790
Funders: National Research Foundation, Korea Institute of Science and Technology, Korea Institute of Science and Technology Information, National Research Foundation of Korea, National Research Council of Science and Technology, Ministry of Science and ICT, South Korea, National Supercomputing Center, Korea Institute of Science and Technology Information
OpenAlex ID: W4409733402
