IR resist patterning by maskless exposure for high-performance applications
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3051495
Authors: Ksenija Varga, Lisa Berger, Tobias Zenger, Boris I. Povazay, Johannes Koch, Matthias Schicke, Yoshiki Takahashi, Yoshinori Taguchi
Institutions: EV Group (Austria), Fujifilm (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409739008