Work

High-NA EUV defectivity inspection: overview and challenges

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051293

Authors: Christophe Beral, Dieter Van Den Heuvel, Matteo Beggiato, Bhavishya Chowrira Poovanna, Sara Paolillo, Alain Moussa, Philippe Foubert, Dorin Cerbu, Annaelle Demaude, Philippe Leray, Anne-Laure Charley

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409759254

FWCI:

Cites: 7

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Related to: 10