Full-wafer 3D metrology solution based on imaging ellipsometry for process uniformity control
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3051267
Authors: Hyukjoon Cho, Yong-Ju Jeon, Jhongkwon Kim, Jinwoo Ahn, Jaewon Lee, Taeyong Jo, Juntaek Oh, Changhyeong Yoon, Jaehyeon Son, Eunsoo Hwang, Donggun Lee, Seunga Lim, Ji Yong Shin, Jinsoo Lee, Jihye Lee, Seulki Kim, Jongmin Roh, Sungjun Ann, Dae Sung Park, Jeongsik Ha, Younghoon Sohn, Hidong Kwak, Yusin Yang, Myungjun Lee
Institution: Samsung Electronics (South Korea)
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409759258