Work

Metrology-design co-optimization for BEOL dimensional characterization using scatterometry

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051471

Authors: Stefan Schoeche, Daniel Schmidt, Padraig R. Timoney, Aron Cepler, Marjorie Cheng, Igor Turovets

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center, Nova Measuring Instruments (United States), Nova Measuring Instruments (Israel)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409759259

FWCI:

Cites: 10

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Related to: 10