Work

Scatterometry-informed machine learning study to determine bi-directional intercorrelation of adjacent patterning steps

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051497

Authors: Padraig R. Timoney, Stefan Schoeche, Daniel Schmidt, Will Parkin, Aron Cepler, Ilya Osherov, Amit Godel, Igor Turovets

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center, Nova Measuring Instruments (United States), Nova Measuring Instruments (Israel)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409759260

FWCI: 2.3

Cites: 5

Cited by: 1

Related to: 10