Work

Optimization toward non-zero offset stability in overlay control: trends and prospects

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051073

Authors: Nadav Gutman, Bart Baudemprez, Hongcheon Yang, Christophe Beral, Anne-Laure Charley, Loemba Bouckou, Roel Gronheid, Yaniv Weiss, Sofia Napso, Linoy Nagar-shaul, Chufan Zhang, Dana Klein, Yuval Lamhot, Yuval Lubashevsky, Renan Milo, Efi Megged

Institutions: KLA (Israel), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409759270

FWCI: 4.717

Cites: 15

Cited by: 2

Related to: 10