Work

Beyond 3 sigma: roughness metrology evolution at the last 20 years (in memory of Ben Bunday)

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3052652

Authors: Roman Kris, Shahar Arad, Shimon Levi, Anna Levant

Institution: Applied Materials (Israel)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409759272

FWCI: 2.293

Cites: 14

Cited by: 1

Related to: 10