A virtual defect metrology system utilizing photolithography scanner topography maps to quantitatively detect gross defects, perform in-line yield prediction, and identify defect generating tools
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3050587
Authors: Prasenjit Bose, Vishal K. Pandey, Michael Staib, Bret Womach, Itamar Balla, Manuel Olmedo, Abhijeet Khandelwal, Thomas Lerner, Ali Ahmadi, Gobind Bisht
Language: English
Subfield: Industrial and Manufacturing Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409759311