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Accurate optical proximity correction using convolutional neural network with feature aggregation

Year: 2025

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.24.2.023201

Authors: Yongkang Liu, Wei Zhao, Xulin Zhang, Yucheng Ji, Ruixiang Yan, Yuandong Gu

Institutions: Shanghai University, Jiujiang University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409786905

FWCI:

Cites: 40

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Related to: 10