Work

Predicting and measuring scummed contact holes

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051142

Authors: Elisa Novelli, Christopher A. Mack, Kolade Oyekan, Jennifer Church, Dominik Metzler, Jennifer Fullam

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409787937

FWCI:

Cites: 4

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Related to: 10