Work

Enabling chemically amplified resists towards tight pitch EUV patterning by directed self-assembly

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3051663

Authors: Lander Verstraete, Rémi Vallat, Julie Van Bel, Min-Gi Jo, Philippe Bézard, Hyo Seon Suh

Institutions: IMEC, Seoul National University of Science and Technology

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409794797

FWCI: 10.07

Cites: 15

Cited by: 2

Related to: 10