Work

Multi-beam mask writer MBM-4000 for high-NA EUV era

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3050966

Authors: Hiroshi Matsumoto, Haruyuki Nomura, Jumpei Yasuda, Shunsuke Isaji, Kenichi Yasui, Hayato Kimura, Yoshinori Kojima

Institution: Nuflare Technology, Inc. (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409794848

FWCI:

Cites: 11

Cited by:

Related to: 10