Work

Ultra-fast correlative chemical-mechanical-polishing (CMP) metrology: integrating phase shifting interferometry with active-probe scanning probe microscopy

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3050140

Authors: Joonho You, Chang-Soo Kim, Ki-Nam Joo, Aditya S. Tan, Fabian Dietrich, Hans-Georg Pietscher, Mirosław Woszczyna, Jaqueline Stauffenberg, Thomas Fröhlich, Eberhard Manske, Thomas Kissinger, Ivo W. Rangelow

Institutions: Chosun University, Technische Universität Ilmenau

Language: English

Topic: Optical measurement and interference techniques

Subfield: Computer Vision and Pattern Recognition

Field: Computer Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409794849

FWCI: 0.796

Cites: 19

Cited by: 1

Related to: 10