Work

Directed self-assembly of medium-chi and high-chi block copolymers for DRAM C/H patterning

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3051487

Authors: Md. S. Rahman, Tomohiro Iwaki, Xianfeng Gao, Wataru Tada, Elizabeth Wolfer, Namgoo Kang, Victor Monreal, Tomonori Okada, Divya K. Parappuram, Edward Ng, Deepak Dharmangadan, Shinji Miyazaki, Durairaj Baskaran, Jerome Wandell, Boaz Alperson

Institution: Micron Memory Japan, K.K. (Japan)

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409795161

FWCI: 10.07

Cites: 6

Cited by: 2

Related to: 10