Mass flow control using estimated output feedback in semiconductor processes
Year: 2025
Type: article
Abstract: In the atomic layer deposition and etching of semiconductor manufacturing, process gas switching in the chamber is critical to improve throughput. Fast flow response is required for the thermal based mass flow controller (MFC) used in the process. However, as the thermal flow sensor installed in the MFC has slow response characteristic, an overshoot occurs in the actual flow into the chamber. And there is a tradeoff between fast response and noise: compensating for the delay in sensor response increases flow noise. This paper proposes a feedback control system that uses an estimated output instead of the sensor output to achieve a fast response without steady-state errors and prevent noise. The proposed control scheme is validated via experiment.
Source: Mechatronics
Institution: Horiba STEC (Japan)
Language: English
Subfield: Control and Systems Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $2,940
OpenAlex ID: W4409838338