Work

Insight into the mechanism of lattice damage in ground and polished InAs substrates

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004487

Authors: Xinyu Lv, Hui Xie, Chenhui Li, Wenwen Yang, Yihan Bai, Guowei Wang, Youwen Zhao, Yingqiang Xu, Lijie Liu, Li He, Guiying Shen

Institutions: Chinese Academy of Sciences, Institute of Semiconductors, University of Chinese Academy of Sciences

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, National Key Research and Development Program of China

Awards: G5722921679, G5784389425, G7947379957, G8328113116

OpenAlex ID: W4409944971

FWCI:

Cites: 43

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Related to: 10