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Full reticle curvilinear inline linearity correction including variable bias with zero turnaround time

Year: 2025

Type: conference-abstract

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3051087

Authors: Paris Spinelli, Nagesh Shirali, Kenichi Yasui, David Araujo, Lindsay Berg, Juan Casillas Plazola, Russell Shoemake

Institutions: Micron (United States), Nuflare Technology, Inc. (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410023950

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