Work

Optimization of NIL and associated processes for the fabrication of advanced devices

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3050873

Authors: Yu Nomura, Keita Sakai, Kiyohito Yamamoto, Ryosuke Hamamoto, Masahiro Tamura, Tomohiro Saito, Makoto Ogusu, Hideki Kunugi, Takahiro Abe, Tomohito Yamaji, Takahiro Kitano, Yusuke Yamamoto

Institutions: Canon (Japan), Tokyo Electron (Japan), Tokyo Electron Kyushu Ltd (Japan)

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410083107

FWCI: 5.796

Cites: 4

Cited by: 2

Related to: 10