Work

Improvement of EUV contact hole pattern rectification using novel directed self-assembly materials

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3051492

Authors: Dong-Ook Kim, JiHoon Kim, Namgoo Kang, YoungJun Her, Shinji Miyazaki, Boaz Alperson

Institutions: IMEC, Merck KGaA, Darmstadt (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410083196

FWCI: 2.358

Cites: 10

Cited by: 1

Related to: 10