Work

Development of UV-NIL resist for semiconductor device manufacturing

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3049916

Authors: Akihiro Hakamata, Kazuyuki Usuki, Koichi Sato

Institution: Fujifilm (Japan)

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410083198

FWCI:

Cites: 2

Cited by:

Related to: 10