Work

Atomic Layer Etching of SiO2 Utilizing Ultra-Low Electron Temperature Plasma

Year: 2025

Type: article

Source: ACS Applied Electronic Materials

DOI: 10.1021/acsaelm.5c00362

Authors: Junyoung Park, Nayeon Kim, Jung-Eun Choi, Yujin Yeo, Min-Seok Kim, Chang-Min Lim, Beom-Jun Seo, Chin-Wook Chung

Institution: Hanyang University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, National Research Foundation of Korea, Korea Semiconductor Research Consortium

Awards: G2252192471, G254945888, G3168497709, G4087693449, G623835629, G6355037862, G7902031766

OpenAlex ID: W4410085180

FWCI: 1.386

Cites: 68

Cited by: 6

Related to: 10