Work

Electrodeposited Co - Ni layered double hydroxide film with tunable dielectric properties for resistive switching

Year: 2025

Type: article

Source: Physical Review Applied

DOI: 10.1103/physrevapplied.23.054010

Authors: Xiaojun Mao, Yi Zhang, Xi Chang, Cheng Qian, Yang Gao, Xiaoyang Xuan, Yueping Niu, Shangqing Gong, Min Qian

Institutions: East China University of Science and Technology, Taishan University

Language: English

Topic: Advanced Memory and Neural Computing

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Shanghai Municipal Education Commission

Award: G1056390879

OpenAlex ID: W4410092756

FWCI: 0.227

Cites: 74

Cited by: 1

Related to: 10