Work

Roughness improvements with new high-chi block copolymers for EUV rectification directed self-assembly

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3051517

Authors: Victor Monreal, Sachin Bobade, Deepak Dharmangadan, Govindaiah Patakamuri, Youngjun Her, Ben Hillen, Durairaj Baskaran

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410192938

FWCI: 5.033

Cites: 11

Cited by: 1

Related to: 10