Work

Investigation of particle induced template damage and proposal of mitigation

Year: 2025

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3050254

Authors: Ryutaro Otahara, Yukichi Kamita, Kyo Otsubo, Masayuki Hatano, Takuya Kono, Masami Yonekawa, Toshihiro Ifuku

Institutions: KIOXIA Corporation (Japan), Canon (Japan)

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410217784

FWCI:

Cites: 5

Cited by:

Related to: 10