Site occupation of Al doping in Lu2SiO5: The role of ionic radius versus chemical valence
Year: 2025
Type: article
Source: Chinese Physics B
Authors: Xuejiao 雪娇 Sun 孙, Yu 宇 Cui 崔, Feng 峰 Gao 高, Zhongjun 中军 Xue 薛, Shuwen 书文 Zhao 赵, Dongzhou 栋舟 Ding 丁, Fan 帆 Yang 杨, Yi-Yang 宜阳 Sun 孙
Language: English
Subfield: Radiation
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4410241081
