Work

Optimized plasmonic enhancement and deformation reduction in MoS 2 monolayers using Au-nanowire-embedded polymers

Year: 2025
Type: article
Abstract: monolayers, suppressing strain-induced dissociation of photo-generated excitons. These findings demonstrate the potential of AuNW-embedded polymers for advanced TMD-based plasmonic device applications.
Source: Nanoscale
Language: English
Open Access status: hybrid
OpenAlex ID: W4410364704
FWCI: 0.482
Cites: 26
Cited by: 2
Related to: 10